Dimension Icon SSRM-HR Highest Resolution Carrier Profiling Solution Bruker’s Dimension Icon® SSRM-HR AFM configuration extends the spatial resolution and repeatability of scanning spreading resistance microscopy (SSRM) carrier profiling to address the stringent needs of current and future ITRS technology nodes. The system’s proven performance has lead IMEC and other leaders in the semiconductor industry to choose Bruker as a partner. Detection of a 5Å wide buried oxide layer in the SSRM signal serves as spatial resolution benchmark, proving previously unattainable performance. Repeated scans across dopant staircases exhibit SSRM signal variations within a few percent, showcasing repeatability that enables the most accurate carrier profiling. The SSRM-HR solution is specifically designed to capitalize on and retain the leading performance and productivity of the Dimension Icon platform. Innovation with Integrity Highest Performance Solution Highest spatial resolution Most repeatable carrier density mapping Most accurate device imaging SSRM signal of a 500nm line scan across 5Å-wide buried oxide layer, proving highest spatial resolution. The location of the buried oxide layer is clearly apparent at the 350nm location as a more than twofold increase in the spreading resistance. Atomic Force Metrology

Limitations of Conventional SSRM However, SSRM spatial resolution has been found to be typically limited to >10nm. A key contribution to the limited spatial resolution comes from the fluid meniscus formed between tip and surface in ambient conditions. By spreading the force exerted by the tip over a larger area, the fluid meniscus lowers the pressure exerted by the tip. As a consequence, even higher force needs to be employed. This high pressure is exerted over a significantly enlarged area where the contact is made, which deforms the sample and severely limits spatial resolution. In addition,...