High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface Application Note MCQ Gas Blender 100 Series Application Dynamic mixtures applied on Deposition techniques Introduction Over the last 20 years, Chemical Vapor Deposition (CVD) processes has taken a key-role in a wide range of technological advanced manufacturing. Today the industrial processes for anti-wear cutting tools coating and microprocessor production share the same deposition techniques, proving a constant self-developing process that is extremely useful and versatile. CVD is a generic name for a huge family of processes that involves the use of gaseous precursors in order to produce high-purity and high performance solid materials. The gaseous phase usually is thermally activated inside the CVD chamber by an adequate heat source to produce a chemical reaction that leads to the desired products formation, and subsequently to the products deposition on the target-substrate. CVD involves the use of hot filaments to activate reactions (HFCVD) and it also requires extremely low working pressures. Different type of heat sources (e.g. plasma, laser) have proved to be useful and now plasma-enhanced deposition (PECVD) and Laser CVD (LCVD) are of common use. Pressure is not a problem anymore since, in some applications, the deposition can be performed in atmospheric pressure (APCVD). The deposition results strongly depend on process parameters and hardware configuration settings. This strong dependence requires a fine control and a fine regulation for each step of this technique. A particularly precise care on the gas phase composed by the reactants must be exercised. An instrument capable of producing gas mixtures with high precision and designed to be versatile and easily manageable is thus required for this kind of applications. The MCQ Instruments offers it all with its Gas Blender 100 Series, a product specifically built for 3 components gas mixture. CVD applications The versatility of CVD technique(s) is proven by its use in a wide array of different research and application fields. The experimentation fields can be summarized in four main categories: thin and thick film applications, powder treatments (fluidized bed CVD) and carbon nanotubes research. Thin films A CVD chamber during the deposition process This term refers to nanometers in coatings up to a few micrometers thickness, made to improve the specific performance of a base material. The synthetic diamond (CVD diamond), due to its unique chemical and physical properties, is a perfect example of thin film application. The hardness and chemical inertness of micro- and nano-crystal diamond films are generally used to increase the wear resistance of metallic/ceramic components [1,2] while single crystal diamonds take a crucial role in the making of cutting tools [3,4]. In the last 20 years CVD diamond has proved itself to be a versatile material studied nowadays for electronic applications in the radiotherapy [5] and in the Gas Blender 100 Series Application Note

High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface spintronics field [6]. On the other hand increasing the anti-wear resistance can be achieved throughout ceramic coatings based on Ti, Cr and Zr [7,8]. Over recent years such coatings have also become an interesting research field for their antibacterial applications [9]. A thick films technology application: Solar Panel Thick films This term refers to micrometers in coatings up to millimeters in thickness, made to improve specific performance of base materials or to create free standing items with desired features....

High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface Exhaust system, implemented for removal of volatile by-products from the reaction chamber. Substrate loading mechanism, an optional feature created for introducing and removing substrates in the chamber without stopping the deposition process. Gas delivery system, used for blending the mixture and supplying it to the reactor chamber. Process control equipment, the wide array of controls installed to monitor process parameters such as pressure, temperature, time and gas mixture properties. Gas Blending: MCQ Solution...

High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface References [1] E. Uhlmann and J. Koenig, CVD diamond coatings on geometrically complex cutting tools – CIRP Ann Manuf Technol 58, 1 (2009) 65-68. [2] F.A. Almeida, J. Sacramento, F.J. Oliveira and R.F. Silva, Micro- and nano-crystalline CVD diamond coated tools in the turning of EDM graphite – Surf Coat Technol 203, 3-4 (2008) 271-276. [3] Y.A. Mankelevich and P.W. May, New insights into the mechanism of CVD diamond growth: Single crystal diamond in MW PECVD reactors – Diamond Relat Mater 17, 7-10 (2008) 1021-1028....